Coverart for item
The Resource Microelectronics, Microsystems and Nanotechnology : Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000, Editors, Androula G. Nassiopoulou, Xanthi Zianni

Microelectronics, Microsystems and Nanotechnology : Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000, Editors, Androula G. Nassiopoulou, Xanthi Zianni

Label
Microelectronics, Microsystems and Nanotechnology : Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000
Title
Microelectronics, Microsystems and Nanotechnology
Title remainder
Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000
Statement of responsibility
Editors, Androula G. Nassiopoulou, Xanthi Zianni
Contributor
Subject
Genre
Language
eng
Summary
This volume contains papers on the following: CMOS devices and devices based on compound semiconductors; processing; silicon integrated technology and integrated circuit design; quantum physics; nanotechnology; nanodevices, sensors and microsystems. Contemporary news and future challenges in these fields are presented in invited papers
Dewey number
621.381
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
2000
http://library.link/vocab/relatedWorkOrContributorName
  • Zianni, Xanthi
  • Conference on "Microelectronics, Microsystems, and Nanotechnology"
http://library.link/vocab/subjectName
  • Microelectronics
  • Microcomputers
  • Nanotechnology
  • Microelectronics
  • Microelectronics
  • Nanotechnology
  • Nanotechnology
Label
Microelectronics, Microsystems and Nanotechnology : Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000, Editors, Androula G. Nassiopoulou, Xanthi Zianni
Instantiates
Publication
Note
"This volume contains the papers presented at the First Conference on "Microelectronics, Microsystems and Nanotechnology" ..."--Foreword
Bibliography note
Includes bibliographical references and index
Color
multicolored
Contents
  • Foreword; CONTENTS; Nanotechnology and Quantum Devices; A New Strategy for In Situ Synthesis of Oligonucleotides Arrays for DNA Chip Technology; Magnetotransport Properties of La-Ca-Mn-O Multilayers; A Novel Method for the Calculation of the Local Electric Field at the Emitting Surface of a Carbon Single-Wall nanotube; Study of Photoluminescence and Micro-Photoluminesence of V-Shaped Quantum Wires; Catalytic Action of Ni Atoms in the Formation of Carbon Nanotubes: A Combined Ab-initio and Molecular Dynamics study; Si Nanocrystal MOS Memory Obtained by Low-Energy Ion Beam Synthesis
  • Charge Effects and Related Transport Phenomena in Nanosize Silicon/Insulator StructuresRadiative Recombination from Silicon Quantum Dots in Si/SiO2 Superlattices; Avalanche Porous Silicon Light Emitting Diodes for Optical Intra-Chip Interconnects; Infrared Absorption in Strained Si/Si1-xGex/Si Quantum Wells; Thermopower Calculations at Filling Factor 3/2 and 1/2 for Two-Dimensional Systems; Thermoelectric Properties of Composite Fermions; Design and Fabrication of Supported-Metal Catalysts Through Nanotechnology
  • Calculated Spontaneous Emission Rates in Silicon Quantum Wires Grown in {100} PlaneElectrical Modeling and Characterization of Si/SiO2 Superlattices; Ge/SiO2 Thin Layers Through Low-Energy Ge+ Implantation and Annealing: Nanostructure Evolution and Electrical Characteristics; Vertical Transport Mechanisms in nc-Si / CaF2 Multi-layers; Photo- and Electroluminescence from nc-Si / CaF2 Superlattices; Ab Initio Calculation of the Optical Gap in Small Silicon Nanoparticles; Ground State Electronic Structure of Small Si Quantum Dots; Processing; Technology Roadmap Challenges for Deep Submicron CMOS
  • Photolithographic Materials for Novel Biocompatible Lift Off ProcessesPolycrystalline Silicon Thin Film Transistors Having Gate Oxides Deposited Using TEOS; Solid Interface Studies with Applications in Microelectronics; A Comparison Between Point Defect Injecting Processes in Silicon Using Extended Defects and Dopant Marker Layers as Point Defect Detectors; Rapid Thermal Annealing of Arsenic Implanted Silicon for the Formation of Ultra Shallow n+p Junctions; Simulation of the Formation and Characterization of Roughness in Photoresists; F2 laser (157 nm) Lithography: Materials and Processes
  • Fabrication of Fine Copper Lines on Silicon Substrates Patterned with AZ 5214 Photoresist via Selective Chemical Vapor DepositionInvestigation of the Nitridation of Al2O3 (0001) Substrates by a Nitrogen Radio Frequency Plasma Source; Simulation of Si and SiO2 Feature Etching in Fluorocarbon Plasmas; Epitaxial ErSi2 on Strained and Relaxed Si1-x Gex; Development of a New Low Energy Electron Beam Lithography Simulation Tool; CMOS Devices and Devices Based on Compound Semiconductors; Advanced SOI Device Architectures for CMOS ULSI
Control code
ocn505142852
Dimensions
unknown
Extent
1 online resource (xvii, 390 pages)
Form of item
online
Isbn
9781281956453
Note
eBooks on EBSCOhost
Other physical details
illustrations
Specific material designation
remote
System control number
(OCoLC)505142852
Label
Microelectronics, Microsystems and Nanotechnology : Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000, Editors, Androula G. Nassiopoulou, Xanthi Zianni
Publication
Note
"This volume contains the papers presented at the First Conference on "Microelectronics, Microsystems and Nanotechnology" ..."--Foreword
Bibliography note
Includes bibliographical references and index
Color
multicolored
Contents
  • Foreword; CONTENTS; Nanotechnology and Quantum Devices; A New Strategy for In Situ Synthesis of Oligonucleotides Arrays for DNA Chip Technology; Magnetotransport Properties of La-Ca-Mn-O Multilayers; A Novel Method for the Calculation of the Local Electric Field at the Emitting Surface of a Carbon Single-Wall nanotube; Study of Photoluminescence and Micro-Photoluminesence of V-Shaped Quantum Wires; Catalytic Action of Ni Atoms in the Formation of Carbon Nanotubes: A Combined Ab-initio and Molecular Dynamics study; Si Nanocrystal MOS Memory Obtained by Low-Energy Ion Beam Synthesis
  • Charge Effects and Related Transport Phenomena in Nanosize Silicon/Insulator StructuresRadiative Recombination from Silicon Quantum Dots in Si/SiO2 Superlattices; Avalanche Porous Silicon Light Emitting Diodes for Optical Intra-Chip Interconnects; Infrared Absorption in Strained Si/Si1-xGex/Si Quantum Wells; Thermopower Calculations at Filling Factor 3/2 and 1/2 for Two-Dimensional Systems; Thermoelectric Properties of Composite Fermions; Design and Fabrication of Supported-Metal Catalysts Through Nanotechnology
  • Calculated Spontaneous Emission Rates in Silicon Quantum Wires Grown in {100} PlaneElectrical Modeling and Characterization of Si/SiO2 Superlattices; Ge/SiO2 Thin Layers Through Low-Energy Ge+ Implantation and Annealing: Nanostructure Evolution and Electrical Characteristics; Vertical Transport Mechanisms in nc-Si / CaF2 Multi-layers; Photo- and Electroluminescence from nc-Si / CaF2 Superlattices; Ab Initio Calculation of the Optical Gap in Small Silicon Nanoparticles; Ground State Electronic Structure of Small Si Quantum Dots; Processing; Technology Roadmap Challenges for Deep Submicron CMOS
  • Photolithographic Materials for Novel Biocompatible Lift Off ProcessesPolycrystalline Silicon Thin Film Transistors Having Gate Oxides Deposited Using TEOS; Solid Interface Studies with Applications in Microelectronics; A Comparison Between Point Defect Injecting Processes in Silicon Using Extended Defects and Dopant Marker Layers as Point Defect Detectors; Rapid Thermal Annealing of Arsenic Implanted Silicon for the Formation of Ultra Shallow n+p Junctions; Simulation of the Formation and Characterization of Roughness in Photoresists; F2 laser (157 nm) Lithography: Materials and Processes
  • Fabrication of Fine Copper Lines on Silicon Substrates Patterned with AZ 5214 Photoresist via Selective Chemical Vapor DepositionInvestigation of the Nitridation of Al2O3 (0001) Substrates by a Nitrogen Radio Frequency Plasma Source; Simulation of Si and SiO2 Feature Etching in Fluorocarbon Plasmas; Epitaxial ErSi2 on Strained and Relaxed Si1-x Gex; Development of a New Low Energy Electron Beam Lithography Simulation Tool; CMOS Devices and Devices Based on Compound Semiconductors; Advanced SOI Device Architectures for CMOS ULSI
Control code
ocn505142852
Dimensions
unknown
Extent
1 online resource (xvii, 390 pages)
Form of item
online
Isbn
9781281956453
Note
eBooks on EBSCOhost
Other physical details
illustrations
Specific material designation
remote
System control number
(OCoLC)505142852

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